Characterization of donorlike interface states which play a dominant role in the surface potential pinning in AlN/GaAs interfaces
- 1 March 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (5) , 2466-2474
- https://doi.org/10.1063/1.345496
Abstract
The interface states at the AlN/GaAs interface, which play a dominant role in pinning the surface potential, are studied by means of quasi-static and high-frequency capacitance transient methods. Their charge transfer processes are found to be well described based on the simple deep-level picture. The observation of both behavior as electron traps as well as hole traps has provided evidence that the ionization of these states, not the surface inversion, is the surface potential pinning mechanism in the present insulator-semiconductor system. The time-variant field effect on the electron emission process is observed and reveals the donor nature of the relevant interface states. It is also argued that a defect-related origin is favored rather than a continuously distributed scheme for the interface states examined in the study.This publication has 17 references indexed in Scilit:
- GaAs and In0.53Ga0.47As MIS Structures Having an Ultrathin Pseudomorphic Interface Control Layer of Si Prepared by MBEJapanese Journal of Applied Physics, 1988
- GaAs MIS structures with SiO 2 using a thin silicon interlayerElectronics Letters, 1988
- Improvement of the Electrical Properties of the AlN/GaAs MIS System and Their Thermal Stability by GaAs Surface Stoichiometry ControlJapanese Journal of Applied Physics, 1988
- Electronic Properties and Modeling of Lattice-Mismatched and Regrown GaAs Interfaces Prepared by Metalorganic Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1988
- Correlation between the Location of the Interface State Minimum at Insulator-Semiconductor Interfaces and Schottky Barrier HeightsJapanese Journal of Applied Physics, 1986
- GaAs–oxide interface states: Gigantic photoionization via Auger-like processJournal of Vacuum Science and Technology, 1981
- Unified defect model and beyondJournal of Vacuum Science and Technology, 1980
- Isothermal Capacitance Transient Spectroscopy for Determination of Deep Level ParametersJapanese Journal of Applied Physics, 1980
- Dynamic properties of interface-state bands in GaAs anodic MOS systemJournal of Vacuum Science and Technology, 1979
- Silicon Impurity Distribution as Revealed by Pulsed MOS C-V MeasurementsJournal of the Electrochemical Society, 1971