Defect and dopant depth profiles in boron-implanted silicon studied with channeling and nuclear reaction analysis
- 1 October 1986
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 17 (3) , 234-241
- https://doi.org/10.1016/0168-583x(86)90062-5
Abstract
No abstract availableKeywords
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