Dynamic hydration effects in an electron microscope cold stage
- 1 April 1988
- journal article
- research article
- Published by Wiley in Journal of Electron Microscopy Technique
- Vol. 8 (4) , 349-354
- https://doi.org/10.1002/jemt.1060080403
Abstract
Water can be a substantial proportion of the residual gas in modern electron microscopes even when frozen hydrated specimens are not used. During measurements of the mass thickness of thin collodion film specimens at low temperatures, it was found that a volatile surface layer (condensed water) modified the apparent rate of mass loss induced by radiation exposure. Mass loss can be enhanced by the presence of water (specimen “etching”), or mass loss can be masked by the dynamic adsorption of water to the specimen surface. The microscope or the grid can be a secondary source of the water; even with cold anticontaminator plates in the vicinity of the specimen, water can be desorbed by x-rays or backscattered electrons. In one typical situation, the mass loss rate appears reduced (due to water adsorption), but the ultimate damage is greater (due to etching). These results illustrate that care must be taken in interpreting mass thickness measurements made in the presence of water and that the lowest stage temperature does not necessarily produce the best observation conditions for all specimens.Keywords
This publication has 7 references indexed in Scilit:
- Mass loss rate in collodion is greatly reduced at liquid helium temperatureJournal of Microscopy, 1987
- A vacuum system for the production of clean carbon filmsJournal of Electron Microscopy Technique, 1987
- Mass thickness determination by electron energy loss for quantitative X‐ray microanalysis in biologyJournal of Microscopy, 1984
- Observations on ice layersUltramicroscopy, 1984
- Electron microscopy of frozen water and aqueous solutionsJournal of Microscopy, 1982
- Mass loss and etching of frozen hydrated specimensJournal of Microscopy, 1979
- Direct measurement of contamination and etching rates in an electron beamJournal of Physics D: Applied Physics, 1976