Optimization of HF last and oxidant wet cleanings for 7 nm gate oxide
- 1 June 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 28 (1-4) , 121-124
- https://doi.org/10.1016/0167-9317(95)00028-7
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Critical Parameters for Obtaining Low Particle Densities on a Si Surface in an HF-Last ProcessJapanese Journal of Applied Physics, 1993