Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition
- 1 September 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (5) , 2785-2790
- https://doi.org/10.1116/1.581422
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
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