Post-hydrogenation of thermal LPCVD a-Si films
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 751-754
- https://doi.org/10.1016/0022-3093(83)90280-6
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Photoconductivity of evaporated amorphous silicon films post-hydrogenated in a theta-pinch plasmaPhysical Review B, 1983
- Highly stable, photosensitive evaporated amorphous silicon filmsApplied Physics Letters, 1981
- Generation of dangling bonds by high temperature annealing and hopping conduction in amorphous silicon filmsSolid State Communications, 1980
- Hydrogen Implantation into CVD Amorphous SiliconJapanese Journal of Applied Physics, 1980
- Characterization of amorphous semiconducting silicon-boron alloys prepared by plasma decompositionPhysical Review B, 1979
- Substitutional doping of chemically vapor-deposited amorphous siliconJournal of Crystal Growth, 1978
- Hydrogenation of evaporated amorphous silicon films by plasma treatmentApplied Physics Letters, 1978
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976