Thin films prepared by sputtering MgF2 in an rf planar magnetron
- 1 December 1985
- Vol. 35 (12) , 531-535
- https://doi.org/10.1016/0042-207x(85)90310-0
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Ion beam processing for coating MgF_2 onto ambient temperature substratesApplied Optics, 1984
- Optical layers produced by sputteringThin Solid Films, 1981
- Plasma polymerization of fluorocarbons in rf capacitively coupled diode systemJournal of Vacuum Science and Technology, 1981
- The properties of films prepared by the rf sputtering of PTFE and plasma polymerization of some freonsVacuum, 1981
- High band gap oxide optical coatings for 0.25 and 1.06 μm fusion lasersThin Solid Films, 1980
- The properties of fluorocarbon films prepared by r.f. sputtering and plasma polymerization in inert and active gasThin Solid Films, 1977
- Correlation between film structure and sorption behaviour of vapour deposited ZnS, cryolite and MgF2 filmsThin Solid Films, 1972
- Optical and Partial Pressure Analysis during Deposition of MgF 2 Films in Ultra High VacuumOptica Acta: International Journal of Optics, 1970
- Inhomogeneity in Refractive Index of Evaporated MgF2 FilmJapanese Journal of Applied Physics, 1968
- Dispersion of Zinc Sulfide and Magnesium Fluoride Films in the Visible SpectrumJournal of the Optical Society of America, 1955