Materials aspects of Ti and Co silicidation of narrow polysilicon lines
- 1 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 473-476
- https://doi.org/10.1016/s0040-6090(96)09012-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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