New developments in ionized-cluster beam and reactive ionized-cluster beam deposition techniques
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1) , 41-51
- https://doi.org/10.1016/0040-6090(79)90098-1
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Ionized-cluster beam epitaxial growth of GaP films on GaP and Si substratesJournal of Crystal Growth, 1978
- Thin film deposition from beams of ionized atoms and clustersJournal of Crystal Growth, 1978
- Characteristics of thin films formed by the ionized-cluster beam techniqueJournal of Crystal Growth, 1978
- Ionized-cluster beam epitaxyJournal of Crystal Growth, 1978
- Solar cells fabricated by ionised-cluster beam technologyIEE Journal on Solidstate and Electron Devices, 1978
- Ionized-cluster beam deposition and epitaxy as fabrication techniques for electron devicesThin Solid Films, 1977
- Cadmium telluride layer deposition using the ionized cluster beam techniqueJournal of Crystal Growth, 1977
- An evaluation of metal and semiconductor films formed by ionized-cluster beam depositionThin Solid Films, 1976
- Effect of ion irradiation on the formation, structure and properties of thin metal filmsThin Solid Films, 1976
- Magnetic Writing on Thin Films of MnBiJournal of Applied Physics, 1957