Derivation of 1ƒ noise in silicon inversion layers from carrier motion in a surface band
- 30 June 1968
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 11 (6) , 621-627
- https://doi.org/10.1016/0038-1101(68)90015-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Surface states and 1/f noise in MOS transistorsIEEE Transactions on Electron Devices, 1967
- Evidence of the Surface Origin of theNoisePhysical Review Letters, 1966
- MOS CONDUCTANCE TECHNIQUE FOR MEASURING SURFACE STATE PARAMETERSApplied Physics Letters, 1965
- Theory of noise in metal oxide semiconductor devicesIEEE Transactions on Electron Devices, 1965
- Electron Mobility Studies in Surface Space-Charge Layers in Vapor-Deposited CdS FilmsJournal of Applied Physics, 1965
- The silicon insulated-gate field-effect transistorProceedings of the IEEE, 1963