Recombination in amorphous SiNx: H alloys
- 1 February 1988
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 57 (2) , 243-257
- https://doi.org/10.1080/13642818808201618
Abstract
Photoluminescence and optically detected magnetic resonance measurements have been used to characterize the recombination processes in a-SiNx: H alloys. A quenching signal near g=2 is explained in terms of non-radiative recombination involving dangling bonds and two tail states, including a component at g=2.01, similar to that in a-Si, with a width which increases with nitrogen content. A broad enhancing signal at g=2 also resembles that seen in a-Si: H, with a width dependent on nitrogen content. Its origin is not yet clear. A signal at g=4 has been assigned to a triplet excitonic recombination process analogous to that proposed for a-SixC1−x: H. The importance of silicon dangling bonds in recombination confirms the predictions of the Robertson–Powell defect model.Keywords
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