Gas mixture dependence of the LCVD of SiO2 films using an ArF laser
- 1 December 1990
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 46 (1-4) , 206-209
- https://doi.org/10.1016/0169-4332(90)90143-n
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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