Deposition and analysis of lithium niobate and other lithium niobium oxides by rf magnetron sputtering

Publisher Website
Google Scholar
Abstract
The deposition of thin films of lithium niobate (LiNbO3) on silicon with rf magnetron sputtering has been investigated. A matrix of experiments was designed to determine the effect of several parameters on the resulting film quality. Under optimized conditions, oriented polycrystalline films of LiNbO3 are produced that exhibit a columnar grain structure with the polar axis normal to the substrate surface. Deviations from sputtering parameters optimized for producing LiNbO3, have been shown to produce films of varying proportions of either LiNb3O8 or Li3NbO4 with LiNbO3. The stoichiometry, microstructure, and electrical properties of selected films have been investigated with Rutherford backscattering, diffractometry, transmission electron microscopy, and a variety of electrical measurement techniques.