CATHODIC ARC DEPOSITION OF FILMS
- 1 August 1998
- journal article
- Published by Annual Reviews in Annual Review of Materials Science
- Vol. 28 (1) , 243-269
- https://doi.org/10.1146/annurev.matsci.28.1.243
Abstract
No abstract availableKeywords
This publication has 96 references indexed in Scilit:
- Application of a vacuum arc model to the determination of cathodic microjet parametersJournal of Physics D: Applied Physics, 1996
- Preparation of TiC and TiC/DLC Multilayers by Metal Plasma Immersion Ion Implantation and Deposition: Relationship between Composition, Microstructure and Wear PropertiesMRS Proceedings, 1996
- Deposition and Properties of Doped Diamondlike Carbon Films Produced by Dual-Source Vacuum Arc Plasma ImmersionMRS Proceedings, 1996
- Transport of vacuum arc plasmas through magnetic macroparticle filtersPlasma Sources Science and Technology, 1995
- Focused injection of vacuum arc plasmas into curved magnetic filtersJournal of Applied Physics, 1994
- The deposition of niobium, NbN and Nb2O5 films by filtered arc evaporationJournal of Materials Science Letters, 1993
- Electrical discharges in vacuum: 1980-90IEEE Transactions on Electrical Insulation, 1991
- Ion-beam-deposited films produced by filtered arcevaporationThin Solid Films, 1990
- The cathode spot of a vacuum arcSoviet Physics Uspekhi, 1978
- Erosion and ionization in the cathode spot regions of vacuum arcsJournal of Applied Physics, 1973