Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation
- 1 October 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (10R)
- https://doi.org/10.1143/jjap.29.2203
Abstract
X-ray mask distortion caused by absorber stress is quantitatively analyzed by using two-dimensional simulation. Simulated results successfully predict the mask pattern distortion in practical mask structures. A square mask window is better than a circular one because the distortion for square windows can be minimized by reducing the pattern length. In addition, it is found that the maximum distortion is virtually the same regardless of the number of LSI chips within the square window mask.Keywords
This publication has 3 references indexed in Scilit:
- Development of SIMUS 2D/F: A stress analysis program for thin multilayer structure.TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A, 1989
- Novel Process For Fabricating Low Distortion X-Ray Masks Of Submicron Gold PatternsPublished by SPIE-Intl Soc Optical Eng ,1988
- X-Ray Mask Distortion: Process And Pattern DependencePublished by SPIE-Intl Soc Optical Eng ,1986