Characterization of Pb(Zr,Ti)O3 thin films by MOCVD using the total reflection X-ray diffraction method
- 1 February 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 15 (1-4) , 1-8
- https://doi.org/10.1080/10584589708015691
Abstract
No abstract availableKeywords
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