Photosensitive organosilicon polymers for microlithographic application
- 1 January 1989
- journal article
- photosensitive polymers
- Published by Wiley in Makromolekulare Chemie. Macromolecular Symposia
- Vol. 24 (1) , 189-199
- https://doi.org/10.1002/masy.19890240119
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Organosilicon deep UV positive resist consisting of poly(p-disilanylenephenylene)Journal of Applied Polymer Science, 1987
- Photolysis of polymeric organosilicon systems. II. Synthesis and photochemical behavior of poly[p-(disilanylene)phenylene]Journal of Polymer Science Part C: Polymer Letters, 1984