Surface contributions to the two-layer structure in the plasma deposition of a-Si : H
- 1 April 1984
- journal article
- letter
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 49 (4) , L47-L52
- https://doi.org/10.1080/13642818408246519
Abstract
Recent studies in several laboratories have shown that some thicknessdependent physical properties of a-Si : H may be modelled on a thin, constant-thickness surface layer adjoining a variable-thickness bulk layer. Water permeation, Auger electron spectroscopy and elastic-recoil detection results from our laboratory all point to contamination of the a-Si : H surface as a source of the thin layer.Keywords
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