Structure and properties of (Ti1−Al )N films prepared by reactive sputtering
Open Access
- 1 May 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 228 (1-2) , 238-241
- https://doi.org/10.1016/0040-6090(93)90607-q
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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