Photo-ionisation threshold yields for the pulsed laser irradiation of diamond films at 266 nm
- 31 October 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (11) , 1430-1433
- https://doi.org/10.1016/0925-9635(93)90153-s
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Microwave plasma chemical vapour deposition of high purity diamond filmsDiamond and Related Materials, 1993
- The characterization of ultra-hard carbon films produced from pre-processed carbon powder in a hybrid physical vapor deposition systemCarbon, 1990
- Mass Spectrometric Study of Vapor Ejected from Graphite and Other Solids by Focused Laser BeamsThe Journal of Chemical Physics, 1964