Response of lithographic mask structures of intense repetitively pulsed x rays: Thermal stress analysis

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Abstract
This paper examines the effects of thermal loading and time history upon the thermal stresses developed in lithographic mask structures as would be expected under irradiation by intense soft x rays. The objective of this work was to examine the phenomenology of the interaction and to evaluate the limits placed upon mask dosage. The mechanics of mask failure are examined in terms of single pulse and cumulative, or fatigue, effects. A number of prototypical mask structures are investigated, which show that the application of intense pulsed sources to x-ray lithography does not reduce the potential utility of the techique. However, it is shown that the estimated damage thresholds do impact the operating conditions chosen for optimal production rates and mask lifetime.

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