Metastable phase formation and structural change characteristics of vapor deposited semiconductor films
- 1 January 1992
- journal article
- research article
- Published by Wiley in Annalen der Physik
- Vol. 504 (6) , 391-398
- https://doi.org/10.1002/andp.19925040602
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Progress and issues of phase-change erasable optical recording mediaThin Solid Films, 1989
- New phase change material for optical recording with short erase timeApplied Physics Letters, 1986
- Preparation and some physical properties of semiconducting GeSb2Te4 crystalsMaterials Research Bulletin, 1972
- An introduction to ovonic researchJournal of Non-Crystalline Solids, 1970