Effects of annealing on TlBaCaCuO thin films
- 13 February 1989
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 54 (7) , 660-662
- https://doi.org/10.1063/1.100911
Abstract
We have studied the effects of high-temperature anneals on sequentially deposited TlBaCaCu films in an environment containing O2 and TlOx . From Auger electron spectroscopy depth profiles, it was found that Tl was quite volatile and can be easily eliminated from the thin films after a short treatment at 830 °C. However, the Tl can be incorporated in the films after appropriate treatment.Keywords
This publication has 5 references indexed in Scilit:
- Superconducting Tl-Ba-Ca-Cu-O films by sputteringApplied Physics Letters, 1988
- Multilayer deposition of Tl-Ba-Ca-Cu-O filmsApplied Physics Letters, 1988
- High, magnetic-field-insensitive transport critical currents in unoriented polycrystalline thin films of Tl2CaBa2Cu2OyPhysica C: Superconductivity and its Applications, 1988
- Superconducting Tl-Ca-Ba-Cu-O thin films with zero resistance at temperatures of up to 120 KApplied Physics Letters, 1988
- THE DECOMPOSITION OF THALLIC OXIDE1Journal of the American Chemical Society, 1929