Growth dynamics studied by RHEED during epitaxy from gaseous hydrides
- 1 December 1994
- journal article
- Published by Elsevier in Surface Science
- Vol. 320 (3) , 259-270
- https://doi.org/10.1016/0039-6028(94)90314-x
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
- Simultaneous molecular beam epitaxy growth and scanning tunneling microscopy imaging during Ge/Si epitaxyApplied Physics Letters, 1993
- X-ray diffraction investigation of single step and step-graded SiGe alloy buffers for the growth of short-period SimGen superlattices using reciprocal space mappingApplied Physics Letters, 1993
- Enhancement mode n -channel Si/SiGe MODFET with high intrinsic transconductanceElectronics Letters, 1992
- Strain relaxation and ordering in SiGe layers grown on (100), (111), and (110) Si surfaces by molecular-beam epitaxyApplied Physics Letters, 1991
- Anisotropy in surface migration of Si and Ge on Si(001)Surface Science, 1991
- 75-GHz f/sub T/ SiGe-base heterojunction bipolar transistorsIEEE Electron Device Letters, 1990
- Electronic structure of Ge/Si monolayer strained-layer superlatticesPhysical Review B, 1989
- Theoretical calculations of heterojunction discontinuities in the Si/Ge systemPhysical Review B, 1986
- Avalanche gain in GexSi1-x/Si infrared waveguide detectorsIEEE Electron Device Letters, 1986
- The influence of reconstruction on epitaxial growth: Ge on Si(100)-(2 × 1) and Si(111)-(7 × 7)Surface Science, 1985