Engineering of plasma deposition systems used for producing large area a-Si:H devices
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 757-760
- https://doi.org/10.1016/s0022-3093(05)80231-5
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Effects of U.V. light on the transport properties of a-Si : H films during their growthJournal of Non-Crystalline Solids, 1987