Direct Patterning and Electrical Properties of Phthalocyanines Thin Films Prepared by Langmuir-Blodgett and Spin Cast Techniques

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Abstract
The patterning and electrical properties of thin films based on two new highly soluble nickelphthalocyanines involving four long alkyl amides (AmPc1 and AmPc2) have been examined. The films were prepared using the Langmuir-Blodgett and spin cast techniques. The film conductivities increased by 2–4 orders of magnitude upon iodine vapor exposure and reached ca. 10-6 S cm-1. Both the AmPc1 and AmPc2 thin films showed negative patterning features to electron beam (EB) dose, and excellent resistance to plasma-assisted dry etching. The AmPc2 possesses high contrast in a LB film (γ=3.8) and high reactivity (D 0=3.5 µC cm-2) in a spin cast film. The fine patterns in the AmPc2 spin cast film have been fabricated down to lines with widths of 0.8 µm (with a 0.8 µm, spacing) using EB irradiation and wet etching, while (probably) maintaining the semiconducting properties of the Pc ring moieties without decomposition.