Atomic scale morphology of the surface of the crystalline Si formed by ion etching
Open Access
- 1 January 1990
- Vol. 12 (1) , 29-32
- https://doi.org/10.1002/sca.4950120106
Abstract
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This publication has 1 reference indexed in Scilit:
- Sputtering of Si with keV Ar+Ions. I. Measurement and Monte Carlo Calculations of Sputtering YieldJapanese Journal of Applied Physics, 1979