Internal stress in sputter-deposited Al2O3 films
- 1 November 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 97 (4) , 333-337
- https://doi.org/10.1016/0040-6090(82)90525-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Some measurements of stress in thin films prepared by low pressure triode sputteringVacuum, 1969