Low energy (⩽ 100 eV) sputtering of thin molybdenum nitride films
- 1 August 1983
- journal article
- Published by Elsevier in Surface Science
- Vol. 130 (2) , 361-372
- https://doi.org/10.1016/0039-6028(83)90367-9
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Compilation and evaluation of ion impact desorption cross-sectionJournal of Nuclear Materials, 1982
- Molybdenum nitride film growth by reaction with N+2 and N+ beams: Energy and dose dependenceApplications of Surface Science, 1982
- Surface pre-treatment dependent formation of molybdenum nitride by low energy N+2 ion bombardmentApplications of Surface Science, 1982
- Theoretical aspects of atomic mixing by ion beamsNuclear Instruments and Methods, 1981
- Design features and focal properties of simple three element two- or three-dimensional lens systems for decelerating intense ion beams to very low energiesNuclear Instruments and Methods, 1980
- Important sputtering yield data for tokamaks: A comparison of measurements and estimatesJournal of Nuclear Materials, 1980
- Ion beam induced desorption of surface layersNuclear Instruments and Methods, 1980
- Recoil mixing in solids by energetic ion beamsNuclear Instruments and Methods, 1980
- Ion-beam-induced migration and its effect on concentration profilesNuclear Instruments and Methods, 1980
- Ion beam studies Part I: The retardation of ion beams to very low energies in an implantation acceleratorNuclear Instruments and Methods, 1976