Ellipsometry measurements of nickel silicides
- 15 March 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 59 (6) , 2165-2167
- https://doi.org/10.1063/1.337025
Abstract
The real (n) and imaginary (k) parts of the refraction index of Ni2Si, NiSi, and NiSi2 silicides are measured by an ellipsometer in the optical range of 4000–7000 Å. The n and k are within the values of 2.0–3.5 for the high-temperature annealed nickel silicides.This publication has 3 references indexed in Scilit:
- Infrared optical constants of PtSiApplied Physics Letters, 1983
- Infrared absorption of thin metal films: Pt on SiApplied Physics Letters, 1983
- Sequence of phase formation in planar metal-Si reaction couplesApplied Physics Letters, 1981