Stress and microstructure of nanocrystalline FeXN (X = Ta, Si, and Al) thin films
- 1 April 1997
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 174 (1-4) , 501-505
- https://doi.org/10.1016/s0022-0248(96)01149-9
Abstract
No abstract availableKeywords
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