Underpotential metal deposition on gold, monitored in situ with a quartz microbalance
- 1 January 1988
- journal article
- Published by Elsevier in Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
- Vol. 239 (1-2) , 321-331
- https://doi.org/10.1016/0022-0728(88)80288-2
Abstract
No abstract availableKeywords
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