Plasma processes in electron-beam controlled rare-gas halide lasers
- 1 October 1978
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 14 (10) , 714-726
- https://doi.org/10.1109/jqe.1978.1069694
Abstract
No abstract availableThis publication has 39 references indexed in Scilit:
- Radiative lifetimes and two-body deactivation rate constants for Ar(3p5, 4p) and Ar(3p5,4p′) statesThe Journal of Chemical Physics, 1978
- Characteristics of the electron-beam-controlled XeF laserApplied Physics Letters, 1978
- New quenching rates applicable to the KrF laserApplied Physics Letters, 1978
- Instability onset in electron-beam-sustained KrF* laser dischargesApplied Physics Letters, 1978
- The radiative lifetime and quenching of KrFApplied Physics Letters, 1978
- Sustained discharge excitation of HgCl and HgBr B2Σ+1/2→X2Σ+1/2 lasersApplied Physics Letters, 1978
- Laser action on the B2Σ+1/2→X2Σ+1/2 band of HgCl at 5576 ÅApplied Physics Letters, 1977
- Gain and absorption measurements in a KrF* laserApplied Physics Letters, 1977
- Threshold power density measurements for electron-beam sustained discharge excitation of XeF and KrFApplied Physics Letters, 1977
- Attachment-dominated electron-beam-ionized dischargesApplied Physics Letters, 1976