Characteristics of the electron-beam-controlled XeF laser
- 1 August 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (3) , 248-250
- https://doi.org/10.1063/1.90315
Abstract
Output power and efficiency for e‐beam‐controlled operation which is comparable to e‐beam‐pumped operation is reported. Under optimum conditions laser enchancements of 3.2 : 1 can be achieved in the presence of an applied electric field at an overall efficiency of ∼1.8%. In this mode of operation greater than 75% of the input energy to the gas is supplied by the sustainer. The concentration of NF3 is the most sensitive parameter for maintaining maximum output power, efficiency, and stable operation.Keywords
This publication has 5 references indexed in Scilit:
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- Compact high-pressure electron-beam-controlled laser systemReview of Scientific Instruments, 1977
- 1-μs laser pulses from XeFApplied Physics Letters, 1977
- Plasma-induced field emission and the characteristics of high-current relativistic electron flowJournal of Applied Physics, 1974
- New cold cathode for pulsed ion lasersIEEE Journal of Quantum Electronics, 1970