Synchrotron Plane Wave X-Ray Topography of 6 inch Diameter Si Crystal
- 1 February 1987
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 26 (2A) , L108-110
- https://doi.org/10.1143/jjap.26.l108
Abstract
A precision three horizontal axis diffractometer system with large crystal stage was developed. It was used for a synchrotron plane wave X-ray topographic camera for a 6 inch Si wafer. A surface sensitive topograph was taken under the condition of specular reflection by (+, +) double crystal arrangement. Change in lattice distortions as small as 0.2 arc second was detected under the condition of plane wave X-ray topography by (+, +, -) triple crystal arrangement.Keywords
This publication has 2 references indexed in Scilit:
- Synchrotron Plane Wave X-Ray Topography of GaAs with a Separate (+, +) Monochro-CollimatorJapanese Journal of Applied Physics, 1985
- Theoretical Considerations on Bragg-case Diffraction of X-rays at a Small Glancing AngleJapanese Journal of Applied Physics, 1971