Characterization of zirconia films deposited by r.f. magnetron sputtering
- 4 December 1998
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 57 (1) , 28-39
- https://doi.org/10.1016/s0921-5107(98)00205-0
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- Structural and optical properties of sputtered Titania filmsMaterials Science and Engineering: B, 1997
- Elaboration and characterization of titania coatingsThin Solid Films, 1997
- Optical properties of mixed yttria–silica filmsApplied Optics, 1989
- High-Tc Superconducting Film on Silicon Substrate with ZrO2 Buffer LayerJapanese Journal of Applied Physics, 1988
- Modifying structure and properties of optical films by coevaporationJournal of Vacuum Science & Technology A, 1986
- Optical properties of narrowband spectral filter coatings related to layer structure and preparationApplied Optics, 1983
- Optical coatings for laser fusion applicationsThin Solid Films, 1980
- Equivalent refractive index of multilayer films of different materialsThin Solid Films, 1974
- The form birefringence of macromoleculesActa Crystallographica, 1953
- X-Ray Line Broadening in MetalsProceedings of the Physical Society. Section A, 1949