A comparison between V2O5 and WO3 thin films as sensitive elements for NO detection
- 4 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 350 (1-2) , 264-268
- https://doi.org/10.1016/s0040-6090(99)00045-0
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Physical and structural characterization of tungsten oxide thin films for NO gas detectionThin Solid Films, 1998
- CO sensing characteristics of reactively sputtered SnO2 thin films prepared under different oxygen partial pressure valuesVacuum, 1996
- Semiconductor gas sensor for detecting NO and CO traces in ambient air of road trafficSensors and Actuators B: Chemical, 1994
- Reactively sputtered indium tin oxide polycrystalline thin films as NO and NO2 gas sensorsThin Solid Films, 1990
- Optical detection of nitrogen monoxide by metal porphine dispersed in an amorphous silica matrixSensors and Actuators B: Chemical, 1990
- A spectroscopic study of electron and ion beam reduction of SnO2(110)Surface Science, 1987
- The enhancement of dark d.c. conductivity by gas adsorption on thin films of macrocyclic copper complexesJournal of Physics and Chemistry of Solids, 1983
- Homogeneous semiconducting gas sensorsSensors and Actuators, 1981
- Oxygen chemisorption on tin oxide: Correlation between electrical conductivity and EPR measurementsJournal of Vacuum Science and Technology, 1980
- Influence of tunnelling through barriers on grain boundaries on hole mobility in polycrystalline tellurium filmsPhysica Status Solidi (a), 1977