New high-contrast developers for poly(methyl methacrylate) resist
- 15 April 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 71 (8) , 4066-4075
- https://doi.org/10.1063/1.350831
Abstract
New developers for poly(methyl methacrylate) consisting of mixtures of common developing components have been carefully investigated. It has been found that adding a small percentage of methyl ethyl ketone to methyl isobutyl ketone and Cellosolve results in a significant increase in contrast. Results of contrast experiments as well as improvements in electron‐beam lithographic exposures are reported. An explanation of the mechanism of contrast and resolution enhancement is offered.This publication has 16 references indexed in Scilit:
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