Characterization of fluoropolymers for 157 nm chemically amplified resist
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6) , 2705-2708
- https://doi.org/10.1116/1.1412889
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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