Understanding Lithography Technology Issues through Simulation
- 1 December 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (12S) , 5823-5828
- https://doi.org/10.1143/jjap.32.5823
Abstract
Simulation has become a very effective means of understanding tradeoffs which arise in implementing innovation in optical projection printing. A number of examples associated with current concerns in image formation under investigation at Berkeley using the SPLAT, SAMPLE and TEMPEST simulators are described. The examples include diffusion effects in chemically amplified resists, imaging in thin films with high numerical aperture lenses, image quality in an exploratory extreme ultra violent (X-ray) system developed by Wood et al. [J. Vac. Sci. Technol. B 7 (1989) 1613] of AT & T, printability of out-of-focus phase-shift defects, edge effects in phase-shift masks, and scattering from underlying topography.Keywords
This publication has 15 references indexed in Scilit:
- Influence of polymer properties on airborne chemical contamination of chemically amplified resistsPublished by SPIE-Intl Soc Optical Eng ,1993
- Detection and Printability of Shifter Defects in Phase-Shifting Masks II. Defocus CharacteristicsJapanese Journal of Applied Physics, 1992
- A utility-based integrated system for process simulationIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1992
- Spatial filtering for depth of focus and resolution enhancement in optical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Three-dimensional simulation of optical lithographyPublished by SPIE-Intl Soc Optical Eng ,1991
- Massively parallel algorithms for scattering in optical lithographyIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1991
- Investigation of the exposure and bake of a positive acting resist with chemical amplificationPublished by SPIE-Intl Soc Optical Eng ,1990
- Short-wavelength annular-field optical system for imaging tenth-micron featuresJournal of Vacuum Science & Technology B, 1989
- Identifying And Monitoring Effects Of Lens Aberrations In Projection PrintingPublished by SPIE-Intl Soc Optical Eng ,1987
- Coherence of defect interactions with features in optical imagingJournal of Vacuum Science & Technology B, 1987