SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures
Open Access
- 31 January 1994
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 40 (1) , 63-70
- https://doi.org/10.1016/0924-4247(94)85031-3
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Surface micromachiningJournal of Micromechanics and Microengineering, 1992
- A RIE process for submicron, silicon electromechanical structuresJournal of Micromechanics and Microengineering, 1992
- Fabrication of micromechanical devices from polysilicon films with smooth surfacesSensors and Actuators, 1989
- Laterally Driven Polysilicon Resonant MicrostructuresSensors and Actuators, 1989
- Silicon as a mechanical materialProceedings of the IEEE, 1982
- The Controlled Etching of Silicon in Catalyzed Ethylenediamine‐Pyrocatechol‐Water SolutionsJournal of the Electrochemical Society, 1979
- Fabrication of novel three-dimensional microstructures by the anisotropic etching ofIEEE Transactions on Electron Devices, 1978