Atomic layer growth of TiO2 on silica
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 60-61, 742-748
- https://doi.org/10.1016/0169-4332(92)90506-s
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Preparation and characterization of Ti (IV) oxide grafted onto silica on a silica gel surfaceColloids and Surfaces, 1991
- The formation of titanium oxide monolayer coatings on silica surfacesJournal of Catalysis, 1991
- Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processesMaterials Chemistry and Physics, 1991
- Preparation and characterization by electrophoretic migration of TiO2—Al2O3 catalytic supportsApplied Catalysis, 1990
- Titania-modified hydrodesulphurization catalystsApplied Catalysis, 1990
- Atomic layer epitaxyMaterials Science Reports, 1989
- Thermally stable SMSI supports: Iridium supported on TiO2-Al2O3 and on Ce-stabilized anataseApplied Catalysis, 1986
- Photoluminescence and photocatalytic activity of highly dispersed titanium oxide anchored onto porous Vycor glassThe Journal of Physical Chemistry, 1985
- Atomic Layer EpitaxyAnnual Review of Materials Science, 1985