Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes
- 31 August 1991
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 28 (4) , 379-388
- https://doi.org/10.1016/0254-0584(91)90073-4
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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