Electric Probe Measurements in an ECR Plasma CVD Apparatus

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Abstract
Plasma diagnostics in the reaction zone of electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) apparatus have been made by the Langmuir probe technique. In addition to a conventional probe analysis, further investigations of the ion saturation current, the floating potential and the electron energy distribution lead to obtaining reliable plasma parameters. For the plasma density, the effect of the magnetic field is taken into account according to Dote's theory. The pressure dependence of the electron temperature can be explained in terms of the balance between the generation and loss of charged particles. The influence of the magnetic field on the electron temperature can be taken into account through this particle balance.