X-ray photoelectron spectroscopy analysis of polyimide films modified by ultraviolet pulsed laser radiation at 193 nm
- 15 February 1994
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 75 (4) , 2015-2019
- https://doi.org/10.1063/1.356301
Abstract
Polyimide films were treated in air with an argon‐fluorine ultraviolet excimer laser (λ=193 nm). X‐ray photoelectron spectroscopy analysis was performed on the modified surfaces after laser exposure at various fluences around the expected threshold fluence Fth. From the present data the photochemical process (photoablation) leads to produce a carbon‐rich surface by ejecting mainly oxides of carbon and nitrogen compounds above a particular fluence Fe.This publication has 14 references indexed in Scilit:
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