Focused Ion Beam Induced Deposition in the High Current Density Region
- 1 November 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (11S)
- https://doi.org/10.1143/jjap.30.3233
Abstract
Focused ion beam induced deposition (FIB·ID) in a high current density region is investigated. High current density experiments are done with current densities of 1.3 A/cm2 and 8.6 A/cm2. A 30 kV Ga+ beam is line-scanned at various scanning speeds over a SiO2 substrate in a W(CO)6 gas environment. To analyze these results, a conventional model is improved by taking into consideration FIB scanning and impurity effects. The FIB·ID is simulated in a wide current density region using the improved model. It is found that shortening the dwell time is more effective than increasing the precursor gas flux for the high current density FIB·ID.Keywords
This publication has 12 references indexed in Scilit:
- Focused ion beam induced deposition of platinum for repair processesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Focused ion beam induced deposition of platinumJournal of Vacuum Science & Technology B, 1990
- Design of a high-current-density focused-ion-beam optical system with the aid of a chromatic aberration formulaJournal of Vacuum Science & Technology B, 1990
- Micromachining and Device Transplantation Using Focused Ion BeamJapanese Journal of Applied Physics, 1990
- Proposal for Device Transplantation using a Focused Ion BeamJapanese Journal of Applied Physics, 1990
- Microfocused ion beam applications in microelectronicsApplied Surface Science, 1989
- Repair of electroplated gold masks for x-ray lithographyJournal of Vacuum Science & Technology B, 1988
- Localized ion beam induced deposition of Al-containing layersJournal of Vacuum Science & Technology B, 1988
- The use of vector scanning for producing arbitrary surface contours with a focused ion beamJournal of Vacuum Science & Technology B, 1988
- High-resolution electron-beam induced depositionJournal of Vacuum Science & Technology B, 1988