Microfocused ion beam applications in microelectronics
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 432-442
- https://doi.org/10.1016/0169-4332(89)90939-2
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
- The EBES4 electron-beam columnJournal of Vacuum Science & Technology B, 1987
- EBES4: A new electron-beam exposure systemJournal of Vacuum Science & Technology B, 1987
- Applications of focused ion beamsNuclear Instruments and Methods in Physics Research, 1983
- The hydrodynamics of liquid metal ion sourcesApplied Physics Letters, 1982
- Ion beam lithographyNuclear Instruments and Methods in Physics Research, 1981
- Comment on “On the mechanism of liquid metal electron and ion sources”Applied Physics A, 1980
- Liquid gold ion sourceJournal of Vacuum Science and Technology, 1979
- An asymmetric electrostatic lens for field-emission microprobe applicationsJournal of Applied Physics, 1979
- A high-intensity scanning ion probe with submicrometer spot sizeApplied Physics Letters, 1979
- Ion source of high brightness using liquid metalApplied Physics Letters, 1975