Ion beam lithography
- 31 December 1981
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 191 (1-3) , 157-168
- https://doi.org/10.1016/0029-554x(81)90999-x
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Ion-beam lithography for IC fabrication with submicrometer featuresJournal of Vacuum Science and Technology, 1979
- Ion beam exposure characteristics of resistsJournal of Vacuum Science and Technology, 1979
- Ion projection system for IC productionJournal of Vacuum Science and Technology, 1979
- H2 and rare gas field ion source with high angular currentJournal of Vacuum Science and Technology, 1979
- A high-intensity scanning ion probe with submicrometer spot sizeApplied Physics Letters, 1979
- Electron irradiation of polymers and its application to resists for electron-beam lithographyCritical Reviews in Solid State and Materials Sciences, 1979
- Self-consistent proximity effect correction technique for resist exposure (SPECTRE)Journal of Vacuum Science and Technology, 1978
- Proximity effect in electron-beam lithographyJournal of Vacuum Science and Technology, 1975
- Time evolution of developed contours in poly-(methyl methacrylate) electron resistJournal of Applied Physics, 1974
- Ion Microprobe Mass AnalyzerJournal of Applied Physics, 1967