Power deposited on a dielectric by multipactor

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Abstract
DWe use a simple transmission line model to evaluate the rf power deposited on a dielectric window by multipactor dis-charge. The calculation employs Monte Carlo simulation, using realistic secondary electron yield curves as input, and taking into account the distributions in the emission velocities and emission angles of the secondary electrons. Beam loading on the external rf, as well as the evolution of the dc electric field due to dielectric charging, are also accounted for. It is found that the buildup of the multipactor space charge, rather than beam loading, causes saturation. Over a wide range of operating conditions and materials, it is found quite generally that the multipactor delivers on the order of 1 percent, or less, of the rf power to the dielectric. A simple estimate is given in support of this ratio, using the susceptibility diagram that was constructed from kinematic considerations. Comparison with experimental results is given.

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