In situ reflection high energy electron diffraction study of the nucleation and growth of tantalum films
- 1 February 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 15 (2) , S21-S23
- https://doi.org/10.1016/0040-6090(73)90052-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Factors controlling the structure of sputtered Ta filmsThin Solid Films, 1973
- X-ray analysis of sputtered films of beta-tantalum and body-centered cubic tantalumThin Solid Films, 1972
- Phase composition and conductivity of sputtered tantalumThin Solid Films, 1970
- Phase Forming Processes in Tantalum Films through SputteringJapanese Journal of Applied Physics, 1970
- Formation of f.c.c., b.c.c. and β-tantalum films by evaporationThin Solid Films, 1968
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965